Structure of Ni-P/Si3N4 composite coatings deposited by the chemical reduction method
Anna Wyszyńska, Maria Trzaska Politechnika Warszawska, Wydział Inżynierii Materiałowej, ul. Wołoska 141, 02-507 Warszawa
Quarterly No. 3, 2006 pages 54-58
DOI:
keywords: microstructure, disperse phase, nickel coating, composite coating, silicon nitride
abstract Composite layers with nickel matrix and Si3N4 disperse phase have been the subject of the present authors’ investigations. The composite layers have been produced by the chemical reduction method. Results of the phase analysis and morphology of the silicon nitride powder are reported (Figs. 1 and 2). The results of investigations of surface and morphology topography of Ni-P and Ni-P/Si3N4 layers, as well as of the structure of produced layers and distributions of Si3N4 phase in nickel matrix are presented in Figures 4, 5, and 8, respectively. The method of computer analysis of images were applied to determine the content of the dispersed phase of silicon nitride in the composite material. The microstructures of the coatings were examined by transmission electron microscope (TEM) (Figs. 6 and 7). Analysis and distribution of individual elements in Ni-P and Ni-P/Si3N4 layers are presented in Figure 9 and Table 1.